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Item Details
Title: PLASMA ETCHING
FUNDAMENTALS AND APPLICATIONS
By: Minoru Sugawara
Format: Hardback

List price: £192.50
Our price: £168.44
Discount:
12.5% off
You save: £24.06
ISBN 10: 019856287X
ISBN 13: 9780198562870
Availability: Usually dispatched within 1-3 weeks.
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Publisher: OXFORD UNIVERSITY PRESS
Pub. date: 28 May, 1998
Series: Series on Semiconductor Science and Technology 7
Pages: 356
Description: The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.
Synopsis: The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.
Illustrations: 2 colour plates, 5 halftones, numerous line figures
Publication: UK
Imprint: Oxford University Press
Returns: Returnable

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