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Item Details
Title:
PLASMA ETCHING
FUNDAMENTALS AND APPLICATIONS
By:
Minoru Sugawara
Format:
Hardback
List price:
£192.50
Our price:
£168.44
Discount:
12.5
% off
You save:
£24.06
ISBN 10:
019856287X
ISBN 13:
9780198562870
Availability:
Usually dispatched within 1-3 weeks.
Delivery rates
Stock:
Currently
0
available
Publisher:
OXFORD UNIVERSITY PRESS
Pub. date:
28 May, 1998
Series:
Series on Semiconductor Science and Technology 7
Pages:
356
Description:
The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.
Synopsis:
The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.
Illustrations:
2 colour plates, 5 halftones, numerous line figures
Publication:
UK
Imprint:
Oxford University Press
Returns:
Returnable
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