| Title:
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ATOMIC LAYER DEPOSITION FOR SEMICONDUCTORS
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| By: |
Cheol Seong Hwang (Editor) |
| Format: |
Paperback |
| List price:
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£139.99 |
| Our price: |
£118.99 |
| Discount: |
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| You save:
|
£21.00 |
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| ISBN 10: |
1489979433 |
| ISBN 13: |
9781489979438 |
| Availability: |
Usually dispatched within 3-5 days.
 Delivery
rates
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| Stock: |
Currently 1item in stock |
| Publisher: |
SPRINGER-VERLAG NEW YORK INC. |
| Pub. date: |
23 August, 2016 |
| Edition: |
Softcover reprint of the original 1st ed. 2014 |
| Pages: |
263 |
| Description: |
This edited volume discusses atomic layer deposition (ALD) for all modern semiconductor devices, moving from the basic chemistry of ALD and modeling of ALD processes to sections on ALD for memories, logic devices, and machines. |
| Synopsis: |
Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device. |
| Illustrations: |
89 black & white illustrations, 81 colour illustrations, 3 black & white |
| Publication: |
US |
| Imprint: |
Springer-Verlag New York Inc. |
| Returns: |
Returnable |