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Item Details
| Title:
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X-RAY DIFFRACTION AT ELEVATED TEMPERATURES
A METHOD FOR IN SITU PROCESS ANALYSIS |
| By: |
Deborah D.L. Chung |
| Format: |
Hardback |
| List price:
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£279.00 |
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We currently do not stock this item, please contact the publisher directly for
further information.
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| ISBN 10: |
0471187267 |
| ISBN 13: |
9780471187264 |
| Publisher: |
JOHN WILEY AND SONS LTD |
| Pub. date: |
26 February, 1993 |
| Pages: |
268 |
| Description: |
In light of the growing importance and availability of intense x-ray sources and position-sensitive detectors, this book offers comprehensive treatment of the principles, instrumentation, and applications of x-ray diffraction at elevated temperatures. |
| Returns: |
Returnable |
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