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Item Details
Title:
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CHEMICAL VAPOR DEPOSITION FOR MICROELECTRONICS
PRINCIPLES, TECHNOLOGY AND APPLICATIONS |
By: |
Arthur Sherman |
Format: |
Hardback |
List price:
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£43.99 |
We currently do not stock this item, please contact the publisher directly for
further information.
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ISBN 10: |
0815511361 |
ISBN 13: |
9780815511366 |
Publisher: |
WILLIAM ANDREW PUBLISHING |
Pub. date: |
31 December, 1988 |
Pages: |
226 |
Description: |
Understanding chemical vapor deposition (CVD) requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology. |
Synopsis: |
Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology. |
Publication: |
US |
Imprint: |
William Andrew Publishing |
Returns: |
Non-returnable |
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