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Item Details
| Title:
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ATOMIC LAYER DEPOSITION
PRINCIPLES, CHARACTERISTICS, AND NANOTECHNOLOGY APPLICATIONS |
| By: |
Tommi Kaariainen |
| Format: |
Electronic book text |
| List price:
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£199.20 |
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We currently do not stock this item, please contact the publisher directly for
further information.
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| ISBN 10: |
1118747348 |
| ISBN 13: |
9781118747346 |
| Publisher: |
JOHN WILEY & SONS INC |
| Pub. date: |
17 May, 2013 |
| Edition: |
2nd Revised edition |
| Pages: |
272 |
| Synopsis: |
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials. |
| Publication: |
US |
| Imprint: |
Wiley-Scrivener |
| Returns: |
Non-returnable |
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Ramadan and Eid al-Fitr
A celebratory, inclusive and educational exploration of Ramadan and Eid al-Fitr for both children that celebrate and children who want to understand and appreciate their peers who do.
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