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Item Details
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PATTERN RECOGNITION AND MACHINE LEARNING
PROCEEDINGS OF THE JAPAN-U.S. SEMINAR ON THE LEARNING PROCESS IN CONTROL SYSTEMS, HELD IN NAGOYA, JAPAN AUGUST 18-20, 1970 |
| By: |
King-Sun Fu (Editor) |
| Format: |
Paperback |
| List price:
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£64.99 |
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We currently do not stock this item, please contact the publisher directly for
further information.
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| ISBN 10: |
1461575680 |
| ISBN 13: |
9781461575689 |
| Publisher: |
SPRINGER-VERLAG NEW YORK INC. |
| Pub. date: |
12 December, 2012 |
| Edition: |
Softcover reprint of the original 1st ed. 1971 |
| Pages: |
344 |
| Synopsis: |
This book contains the Proceedings of the US-Japan Seminar on Learning Process in Control Systems. The seminar, held in Nagoya, Japan, from August 18 to 20, 1970, was sponsored by the US-Japan Cooperative Science Program, jointly supported by the National Science Foundation and the Japan Society for the Promotion of Science. The full texts of all the presented papers except two t are included. The papers cover a great variety of topics related to learning processes and systems, ranging from pattern recognition to systems identification, from learning control to biological modelling. In order to reflect the actual content of the book, the present title was selected. All the twenty-eight papers are roughly divided into two parts--Pattern Recognition and System Identification and Learning Process and Learning Control. It is sometimes quite obvious that some papers can be classified into either part. The choice in these cases was strictly the editor's in order to keep a certain balance between the two parts. During the past decade there has been a considerable growth of interest in problems of pattern recognition and machine learn- ing.In designing an optimal pattern recognition or control system, if all the a priori information about the process under study is known and can be described deterministically, the optimal system is usually designed by deterministic optimization techniques. |
| Illustrations: |
biography |
| Publication: |
US |
| Imprint: |
Springer-Verlag New York Inc. |
| Returns: |
Returnable |
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