RESEARCH ADVANCES IN DATABASE AND INFORMATION SYSTEMS SECURITY by Vijay Atluri (Editor), John Hale (Editor) ( 9781475764116 )

Item Details

Title:

RESEARCH ADVANCES IN DATABASE AND INFORMATION SYSTEMS SECURITY
IFIP TC11 WG11.3 THIRTEENTH WORKING CONFERENCE ON DATABASE SECURITY JULY 25-28, 1999, SEATTLE, WASHINGTON, USA

By:

Vijay Atluri (Editor), John Hale (Editor)

Format:

Paperback

List price:	£119.99
We currently do not stock this item, please contact the publisher directly for further information.

ISBN 10:

1475764111

ISBN 13:

9781475764116

Publisher:

SPRINGER-VERLAG NEW YORK INC.

Pub. date:

11 January, 2013

Edition:

Softcover reprint of the original 1st ed. 2000

Series:

IFIP Advances in Information and Communication Technology 43

Pages:

332

Synopsis:

Computer technology evolves at a rate that challenges companies to maintain appropriate security for their enterprises. With the rapid growth in Internet and www facilities, database and information systems security remains a key topic in businesses and in the public sector, with implications for the whole of society. Research Advances in Database and Information Systems Security covers issues related to security and privacy of information in a wide range of applications, including: Critical Infrastructure Protection; Electronic Commerce; Information Assurance; Intrusion Detection; Workflow; Policy Modeling; Multilevel Security; Role-Based Access Control; Data Mining; Data Warehouses; Temporal Authorization Models; Object-Oriented Databases. This book contains papers and panel discussions from the Thirteenth Annual Working Conference on Database Security, organized by the International Federation for Information Processing (IFIP) and held July 25-28, 1999, in Seattle, Washington, USA. Research Advances in Database and Information Systems Security provides invaluable reading for faculty and advanced students as well as for industrial researchers and practitioners engaged in database security research and development.

Illustrations:

XXII, 332 p.

Publication:

Imprint:

Springer-Verlag New York Inc.

Returns:

Returnable

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